Goedicke, K.K.GoedickeMetzner, C.C.MetznerScheffel, B.B.Scheffel2022-03-082022-03-081996https://publica.fraunhofer.de/handle/publica/303443The method concerns control of a coating process in which substrates (6) are coated from at least one coating source (4) located in any position in a vacuum chamber (1), and at least one process parameter is adapted to the coating conditions by means of at least one control system. The total weight of the coating material and the coating source is measured. At least one signal is derived from the measurement results, and is fed as input to the control system. Also claimed is an appts. for implementation of the method. The appts. is novel in that it has load measurement cells (5) attached to the vacuum chamber (1) and connected electrically to the process control system. USE - For coating substrates, in particular, in the form of plates and strip with functional layers. ADVANTAGE - High-quality layers of uniform thickness and specified composition can be reliably produced by evaporation and sputtering processes.de608667670620patent1996-19605315