Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples

Garbowski, TomaszTomaszGarbowskiPanteleit, FriedhelmFriedhelmPanteleitDellemann, GregorGregorDellemannGutsch, ManuelaManuelaGutschHohle, ChristophChristophHohleReich, ElkeElkeReichRudolph, MatthiasMatthiasRudolphSteidel, KatjaKatjaSteidelThrun, XaverXaverThrunZeidler, DirkDirkZeidler2022-03-132022-03-132016https://publica.fraunhofer.de/handle/publica/39313110.1117/12.2225501en621Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samplesconference paper