Steingrüber, R.R.SteingrüberFerstl, M.M.Ferstl2022-03-092022-03-092000https://publica.fraunhofer.de/handle/publica/33634810.1016/S0167-9317(00)00373-72-s2.0-0034205479The fabrication of three-dimensional microstructure elements by electron-beam lithography and dry etching technique is shown for the example of typical three-dimensional optical structures (Echelette gratings, computer generated diffractive optical elements and Fresnel zone lenses). Several different structures, mainly for use in micro-optics with feature sizes in the micrometer range and below were realised. The utilisation of electron-beam lithography thereby proved to be extremely flexible and precise.endiffraction gratingsdiffractive optical elementselectron beam lithographymicro-opticsmicrolensesoptical fabricationsputter etchingthree-dimensional microstructure elementdry etchingfabricationechelette gratingcomputer generated diffractive optical elementfresnel zone lens621conference paper