Pichler, P.P.PichlerDürr, R.R.DürrHolzer, N.N.HolzerSchott, K.K.SchottBarthel, A.A.BarthelLorenz, J.J.LorenzRyssel, H.H.Ryssel2022-03-082022-03-081989https://publica.fraunhofer.de/handle/publica/316706Numerical simulation of processes has shown to be an important tool for development in the fields of VLSI and power devices. To satisfy the particular needs, ICECREM has been developed as one-dimensional process simulator during a period of nearly one decade, and COMPLAN has been designed to enable two-dimensional simulation of ion-implantation on a personal computer. A general overview of the program structures and the implemented models will be given and applications will be shown.enprocess simulationprogram670620530conference paper