Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale

Under CopyrightYanev, V.V.YanevErlbacher, T.T.ErlbacherRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, L.L.Frey2022-03-114.9.20122009https://publica.fraunhofer.de/handle/publica/36584710.24406/publica-fhg-365847entunneling atomic force microscopy (TUNA)conductive atomic force microscopy (c-AFM)high-k dielectrics670620530Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscaleposter