Fühner, T.T.FühnerEvanschitzky, P.P.EvanschitzkyErdmann, A.A.Erdmann2022-03-112022-03-112012https://publica.fraunhofer.de/handle/publica/37616210.1117/12.916529This paper presents a combined source/mask/projector pupil optimization (SMPO) procedure, aiming at the maximization of the common process window of different line/space configurations. The parameters are given by a pixelated source representation, sizes of the main features and the SRAF configuration. The projector wavefront is varied through the coefficients of the Fringe-Zernike polynomials for spherical aberrations. A genetic algorithm is applied as the underlying optimization algorithm. A number of results are presented and discussed, demonstrating the feasibility and potentials of the approach.en670conference paper