Berzins, J.J.BerzinsIndrisiunas, S.S.IndrisiunasErve, K. vanK. vanErveNagarajan, A.A.NagarajanFasold, S.S.FasoldSteinert, M.M.SteinertGerini, G.G.GeriniGecys, P.P.GecysPertsch, T.T.PertschBäumer, S.M.B.S.M.B.BäumerSetzpfandt, F.F.Setzpfandt2022-03-062022-03-062020https://publica.fraunhofer.de/handle/publica/26301010.1021/acsnano.0c019932-s2.0-85085532172High-index dielectric metasurfaces featuring Mie-type electric and magnetic resonances have been of great interest in a variety of applications such as imaging, sensing, photovoltaics, and others, which led to the necessity of an efficient large-scale fabrication technique. To address this, here we demonstrate the use of single-pulse laser interference for direct patterning of an amorphous silicon film into an array of Mie resonators a few hundred nanometers in diameter. The proposed technique is based on laser-interference-induced dewetting. A precise control of the laser pulse energy enables the fabrication of ordered dielectric metasurfaces in areas spanning tens of micrometers and consisting of thousands of hemispherical nanoparticles with a single laser shot. The fabricated nanoparticles exhibit a wavelength-dependent optical response with a strong electric dipole signature. Variation of the predeposited silicon film thickness allows tailoring of the resonances in the targeted visible and infrared spectral ranges. Such direct and high-throughput fabrication is a step toward a simple realization of spatially invariant metasurface-based devices.endielectric nanostructuredirect laser interference patterninglaser-matter interactionmetasurfacesmultibeam interference620540journal article