Bourgin, Y.Y.BourginVoigt, D.D.VoigtKäsebier, T.T.KäsebierKley, E.-B.E.-B.KleyZeitner, U.D.U.D.Zeitner2022-03-132022-03-132016https://publica.fraunhofer.de/handle/publica/39465210.1117/12.22186102-s2.0-84987827773Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. The high resolution interferogram is realized by the overlapping and the interference of the propagating beams. By applying the techniques known as Self-Aligned Double Patterning (SADP), it´s possible to decrease the period of the fabricated grating (350 nm) by a factor of two, and thus reaching the 90nm structure width. As application, metallic gratings have been fabricated operating as wire grid polarizer (WGP).enconference paper