Schiller, S.S.SchillerGoedicke, K.K.GoedickeReschke, J.J.ReschkeKirchhoff, V.V.KirchhoffSchneider, S.S.SchneiderMilde, F.F.Milde2022-03-032022-03-031993https://publica.fraunhofer.de/handle/publica/18393110.1016/0257-8972(93)90248-M2-s2.0-0027908068en667670620543Pulsed magnetron sputter technologyjournal article