Pongratz, S.S.PongratzBetz, H.H.BetzHeuberger, A.A.Heuberger2022-03-082022-03-081983https://publica.fraunhofer.de/handle/publica/313587enLithographiePhotolackRöntgenstrahlenApplication of novolack resist systems in x-ray mask fabricationconference paper