Under CopyrightRachdi, LazharLazharRachdiLossen, JanJanLossenRudolph, DominikDominikRudolphSharma, Y.P.Y.P.SharmaKoduvelikulathu, Lejo JosephLejo JosephKoduvelikulathuPolzin, Jana-IsabelleJana-IsabellePolzinSchmidt, StefanStefanSchmidtPernau, ThomasThomasPernauWolf, AndreasAndreasWolf2023-11-302023-11-302023Note-ID: 00008B66https://publica.fraunhofer.de/handle/publica/457383https://doi.org/10.24406/publica-222510.4229/EUPVSEC2023/1AO.5.610.24406/publica-2225In this research, we present the design and optimization of an interdigitated back contact (IBC) solar cell. The cell utilizes a cost-effective, commonly used substrate material, a Cz-Si Ga-doped wafer. The proposed processing techniques are all well-known from high-volume Passivated Emitter and Rear Cell (PERC) production, allowing for efficient utilization of existing production tools. The solar cell design features a front floating emitter and rear passivated contacts, with an in-situ doped a-Si layer deposited by plasma enhanced chemical vapor deposition (PECVD). Our process optimization efforts presented in this work have resulted in a current champion cell with a conversion efficiency of 22.94%.eninterdigitated back contactIBCTOPConpassivated contactsDevelopment and Process Optimization of a p-IBC Solar Cell with PECVD Deposited Passivated Contactsconference paper