Dietsch, R.R.DietschMai, H.H.MaiPompe, W.W.PompeSchöneich, B.B.SchöneichVöllmar, S.S.VöllmarHopfe, S.S.HopfeScholz, R.R.ScholzWehner, B.B.WehnerWeißbrodt, P.P.WeißbrodtWendrock, H.H.Wendrock2022-03-082022-03-081992https://publica.fraunhofer.de/handle/publica/319945The paper describes first results wiht a new designed target/substrate/handling system for LPVD of multilayer structures with a good thickness homogenity. Resulting thickness profiles calculated for various handling regimes show a substantial thickness homogeneization as compared to the conventional arrangement. For the preparation of various thin solid films (C, Ni) and C/Ni-multilayers a Nd-YAG-laser (wavelength 1064 nm, pulse energy 0.9 J, pulse length 7 ns, repetition rate 30 Hz) was used. The layers were characterized by ellipsometry, X-ray diffraction, TEM cross-section.enBildverarbeitungdünne SchichtEllipsometrieellipsometryimage processinglaser ablationNi/C multilayer structureNi/C-Multischichtplasma sourcePlasmaquelleRöntgenbeugungRöntgenspiegelSNMS depth profilingSNMS-TiefenprofilanalyseTEM-cross-sectionthin filmsUHV-AbscheideeinrichtungUHV-deposition equipmentx-ray diffractionX-ray mirror667621671conference paper