Plasmatron sputtering for the production of high stability NiCr resistive films

Schiller, S.S.SchillerHeisig, U.U.HeisigGoedicke, K.K.GoedickeBilz, H.H.BilzHenneberger, J.J.HennebergerBrode, W.W.BrodeDietrich, W.W.Dietrich2022-03-022022-03-021984https://publica.fraunhofer.de/handle/publica/17150310.1016/0040-6090(84)90536-4en667670620541Plasmatron sputtering for the production of high stability NiCr resistive filmsjournal article