Integrated vapor-phase cleaning and pure NO nitridation for gate stack formation

Glowacki, F.F.GlowackiFroeschle, B.B.FroeschleDeutschmann, L.L.DeutschmannSagnes, I.I.SagnesLaviale, D.D.LavialeBensahel, D.D.BensahelGalimaoui, A.A.GalimaouiMartin, F.F.MartinBauer, A.J.A.J.Bauer2022-03-092022-03-091997https://publica.fraunhofer.de/handle/publica/328462en670620530Integrated vapor-phase cleaning and pure NO nitridation for gate stack formationconference paper