Finck, A. vonA. vonFinckHauptvogel, M.M.HauptvogelDuparre, A.A.Duparre2022-03-042022-03-042011https://publica.fraunhofer.de/handle/publica/22466610.1364/AO.50.00C321Scatter analysis is an effective method for the characterization of thin film components. The new highly sensitive table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance, Reflectance and Optical Scatter Measurement-Table Top) has been developed at the Fraunhofer Institute in Jena to meet the specific requirements for close-to-process applications. Extremely high sensitivity with a noise equivalent angle resolved scatter level of 2 x 10(-8) sr(-1), full three-dimensional spherical measurement capability, and an instrument size as small as 0.8 m x 0.8 m x 0.8 m have been achieved. Details of specifications, optical components, and software are presented, including a comparison to our laboratory system. Anisotropy analysis of diamond-turned aluminum substrates as well as substrate and coating characterization are demonstrated as examples of application.en620535Instrument for close-to-process light scatter measurements of thin film coatings and substratesjournal article