Influence of Interfacial Oxides at the TCO/a-Si Contact on the Fill Factor of SHJ Solar Cells

Under CopyrightMeßmer, Christoph AlexanderChristoph AlexanderMeßmerBivour, MartinMartinBivourLuderer, ChristophChristophLudererTutsch, LeonardLeonardTutschSchön, JonasJonasSchönHermle, MartinMartinHermle2022-03-1425.2.20202019https://publica.fraunhofer.de/handle/publica/40593510.24406/publica-fhg-405935enQualitätssicherungCharakterisierung und SimulationPhotovoltaikSilicium-PhotovoltaikHerstellung und Analyse von hocheffizienten Si-SolarzellensiliconheterojunctionsimulationtunnelingTCADSentaurus TCADamorphous silicontrap-assisted tunnelingselectivityTOPCon621697Influence of Interfacial Oxides at the TCO/a-Si Contact on the Fill Factor of SHJ Solar Cellspresentation