Schulz, U.U.SchulzPräfke, C.C.PräfkeGödeker, C.C.GödekerKaiser, N.N.KaiserTünnermann, A.A.Tünnermann2022-03-042022-03-042011https://publica.fraunhofer.de/handle/publica/22428310.1364/AO.50.000C31Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.en620535Plasma-etched organic layers for antireflection purposesjournal article