Burte, E.P.E.P.BurteRausch, N.N.Rausch2022-03-032022-03-031995https://publica.fraunhofer.de/handle/publica/18658710.1016/0022-3093(95)00219-7en670620530Low pressure chemical vapour depostition of tantalum pentoxide thin layersjournal article