Alignment accuracy in a MA/BA8 GEN3 using substrate conformal imprint lithography (SCIL)

Fader, R.R.FaderSchömbs, U.U.SchömbsVerschuuren, M.M.Verschuuren2022-03-042022-03-042013https://publica.fraunhofer.de/handle/publica/235127en670620530Alignment accuracy in a MA/BA8 GEN3 using substrate conformal imprint lithography (SCIL)journal article