Integration of (Poly-Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer-Level MOEMS Fabrication Process

Helke, ChristianChristianHelkeSeiler, JanJanSeilerMeinig, MarcoMarcoMeinigGroßmann, ToniToniGroßmannBonitz, JensJensBonitzHaase, MichaMichaHaaseZimmermann, SvenSvenZimmermannEbermann, M.M.EbermannKurth, S.S.KurthReuter, DannyDannyReuterHiller, KarlaKarlaHiller2024-02-222024-02-222024-02-222024https://publica.fraunhofer.de/handle/publica/46238110.1002/tee.239602-s2.0-85179355994This paper reports the development and integration of (Poly-Si/Air)n Distributed BRAGG Reflectors (DBR) in a MOEMS Fabry-Pérot-Interferometer (FPI) concept. The realized reflectors constitute a promising and resource-efficient alternative to complex Ion-Assisted Deposition based DBRs while maintaining their advantages. Compared to state of the art MOEMS FPIs the (Poly-Si/Air)n DBRs can be integrated into two moveable reflector carriers based on two individually fabricated wafers which are bonded. The (Poly-Si/Air)n DBRs are investigated as (HL) and (HL)2 reflector stacks showing a reflectance above 91% within the wavelength range of 2.8-5.7 μm.enetalonFabry-Pérot interferometermicro spectrometerPoly-Sireflectortunable filterIntegration of (Poly-Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer-Level MOEMS Fabrication Processjournal article