Mask defect printing mechanisms for future lithography generations

Erdmann, A.A.ErdmannGraf, T.T.GrafBubke, K.K.BubkeHöllein, I.I.HölleinTeuber, S.S.Teuber2022-03-102022-03-102006https://publica.fraunhofer.de/handle/publica/35233510.1117/12.655558en670620530Mask defect printing mechanisms for future lithography generationsconference paper