Laser-recrystallized polycristalline silicon resistors for integrated circuits application

Schaber, H.H.SchaberCutter, D.D.CutterObermeier, E.E.ObermeierBinder, J.J.Binder2022-03-022022-03-021983https://publica.fraunhofer.de/handle/publica/171906enintegrationLaserannealingPolysiliziumRekristallisation530Laser-recrystallized polycristalline silicon resistors for integrated circuits applicationjournal article