Heinemann, M.M.HeinemannSchindler, B.B.SchindlerSöder, B.B.SöderBauser, H.H.BauserOehr, C.C.Oehr2022-03-082022-03-081991https://publica.fraunhofer.de/handle/publica/318477A reaction chamber for plasma deposition, designed in view of industrial plasma processes, has been tested by plasma polymerization of tetramethoxysilane/oxygen mixtures on polycarbonate substrates. Deposition rates have been measured as a function of parameters such as total pressure, gas flows, and the substrate coordinates in relation to the electrode dimensions. The polymeric films are characterized by IR- spectroscopy, ESCA, and thickness measurements.en610620660conference paper