Rumler, MaximilianMaximilianRumlerFoerthner, M.M.FoerthnerBaier, L.L.BaierEvanschitzky, P.P.EvanschitzkyBecker, M.M.BeckerRommel, M.M.RommelFrey, L.L.Frey2022-03-052022-03-052017https://publica.fraunhofer.de/handle/publica/24820010.1088/2399-1984/aa6560This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extendedRCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp® instead of often applied PECVD-SiO2 was investigated.ennanoimprint lithographysoft lithographyplasmonicscolour filter670620530journal article