Gischkat, ThomasThomasGischkatSchachtler, D.D.SchachtlerSteger, F.F.StegerBalogh-Michels, Z.Z.Balogh-MichelsBotha, R.R.BothaVetsch, B.B.VetschStrüning, T.T.StrüningBirkhölzer, J.J.BirkhölzerMichler, M.M.MichlerMühlig, ChristianChristianMühligSchwinde, StefanStefanSchwindeTrost, MarcusMarcusTrostSchröder, S.S.SchröderBorzi, A.A.BorziNeels, A.A.Neels2023-02-012023-02-012022https://publica.fraunhofer.de/handle/publica/43467110.1364/OIC.2022.ThC.62-s2.0-85139142902The effect of low temperature ion beam sputtering on thin film properties was investigated. The SiO2 and Ta2O5 films grown at 0°C show a trend of lower optical losses and higher LIDT compared to 100°C.enIon beamsSilicaSputteringTantalum oxidesTemperatureconference paper