Zimmermann, S.S.ZimmermannZhao, Q.T.Q.T.ZhaoHöhnemann, H.H.HöhnemannWiemer, M.M.WiemerKaufmann, C.C.KaufmannMantl, S.S.MantlDudek, V.V.DudekGessner, T.T.Gessner2022-03-102022-03-102007https://publica.fraunhofer.de/handle/publica/35564410.1016/j.mee.2007.05.056en621Roughness improvement of the COSi2/Si-interface for an application as buried silicideconference paper