In-situ HCL etching for optical confinement in crystalline silicon thin-film solar cells

Schmich, EvelynEvelynSchmichReber, S.S.ReberWilleke, GerhardGerhardWilleke2022-03-102022-03-102005https://publica.fraunhofer.de/handle/publica/349593en621697In-situ HCL etching for optical confinement in crystalline silicon thin-film solar cellsconference paper