Huber, H.-L.H.-L.HuberMescheder, U.U.MeschederMund, F.F.Mund2022-03-022022-03-021987https://publica.fraunhofer.de/handle/publica/176008A linewidtdh metrology based on electron optical methods has been developed and applicated to X-ray masks with subhalf-micron feature size. The sensitivity of the measurement technique to process variations has been investigated. Linewidth down to 0.2 mym on X-ray masks are measured automatically with high precision (24 nm at 3 sigma) and high throughput feasibility. (IMT)enMetrologiemetrologyRöntgenmaskentechnologieX-ray lithography621journal article