Hasche, K.K.HascheHerrmann, K.K.HerrmannKrumrey, M.M.KrumreyUlm, G.G.UlmSchädlich, S.S.SchädlichFrank, W.W.FrankProcop, M.M.Procop2022-03-092022-03-092001https://publica.fraunhofer.de/handle/publica/337752The paper refers to the development, manufacture and metrological evaluation of artifacts for the thickness of an ultra-thin film deposited on a substrate. The artifacts shall be applicable as metrological reference standards for the calibration of film thickness measurement systems like X-ray reflectometers or ellipsometers. This calibration shall contribute to consistent traceable measurement results.enNanotechnologienm-Präzisionsschichtmechanische SchichtcharakterisierungRöntgenoptikPVDOptikGeometrieRauhigkeitTopographieSchichtdickeSpektroskopieSchichtMultischichtNanomaterialienGrenzfläche667621671conference paper