Cullmann, E.E.CullmannLöchel, B.B.LöchelMaciossek, A.A.MaciossekRothe, M.M.Rothe2022-03-032022-03-031996https://publica.fraunhofer.de/handle/publica/18781910.1016/0167-9317(95)00307-X2-s2.0-0029733017en621Advanced resist processing for thick photoresist applicationsjournal article