Characterization of a-SiCx:H thin films as an encapsulation material for integrated silicon based neural interface devices

Hsu, J.-M.J.-M.HsuTathireddy, P.P.TathireddyRieth, L.L.RiethNormann, A.R.A.R.NormannSolzbacher, F.F.Solzbacher2022-03-032022-03-032007https://publica.fraunhofer.de/handle/publica/21357610.1016/j.tsf.2007.04.050en610620541Characterization of a-SiCx:H thin films as an encapsulation material for integrated silicon based neural interface devicesjournal article