Scheffel, BertBertScheffelZywitzki, OlafOlafZywitzkiKopte, TorstenTorstenKopte2023-09-072023-09-072023https://publica.fraunhofer.de/handle/publica/45033910.2139/ssrn.4504278A physical vapor deposition process using anodic arc evaporation in combination with a hollow cathode arc discharge was applied to the evaporation of graphite for deposition of hydrogen-free carbon layers. The diamond-like carbon (DLC) films deposited on 100Cr6 steel substrates were investigated by nanoindentation, Raman spectrometry, FE-SEM and spectroscopic ellipsometry. The relationships between the process parameters and the coating properties are discussed. Coatings deposited without bias voltage at substrate temperatures < 200°C are very hard (61-75 GPa) with also very high Young's modulus (588-685 GPa). The evaluation of the Raman spectra indicated a high proportion of tetrahedral sp3 bonds in the range of 70-88 %. The coatings proved to be completely droplet-free. The coating rates in the range of 4-18 nm/s are exceptionally high for such ta-C coatings, which is a good prerequisite for industrial applications. The ta-C layers with very high hardness and smooth surface are well suited as wear resistant layers.enTetrahedral amorphous carbonta-CDiamond-like carbonAnodic arcVacuum arc evaporationHollow cathode arcDDC::600 Technik, Medizin, angewandte Wissenschaftenpaper