Lopez, E.E.LopezDresler, B.B.DreslerLeupolt, B.B.LeupoltDani, I.I.DaniKaskel, S.S.KaskelBeyer, E.E.Beyer2022-03-112022-03-112010https://publica.fraunhofer.de/handle/publica/367158en621671Plasma etching of SnO2: F films at atmospheric pressure for silicon thin film solar cellsconference paper