Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write

Under CopyrightThrun, XaverXaverThrunChoi, Kang-HoonKang-HoonChoiGutsch, ManuelaManuelaGutschHohle, ChristophChristophHohleRudolph, MatthiasMatthiasRudolphSeidel, KonradKonradSeidel2022-03-1215.10.20152015https://publica.fraunhofer.de/handle/publica/38925710.24406/publica-fhg-389257en621Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct writeposter