A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography

Schnattinger, T.T.SchnattingerErdmann, A.A.Erdmann2022-03-102022-03-102008https://publica.fraunhofer.de/handle/publica/35983410.1117/12.7725072-s2.0-57649094587en670620530A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithographyconference paper