Kaless, A.A.KalessSchulz, U.U.SchulzMunzert, P.P.MunzertKaiser, N.N.Kaiser2022-03-032022-03-032005https://publica.fraunhofer.de/handle/publica/20772310.1016/j.surfcoat.2005.01.0672-s2.0-24644513886The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.enion bombardmentnanostructurepolymersroughness620journal article