Badawi, BassemBassemBadawiKutter, ChristophChristophKutter2022-11-072022-11-072022-11-01https://publica.fraunhofer.de/handle/publica/42836410.1117/12.2641182In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography. We demonstrate in detail how the variables of the model are determined and optimized in a parameter definition procedure. The principle work ow for a automated mask generation is shown on a pyramid sample structure. Additionally, we tested a top and bottom anti-reflective coating for the use of surface smoothening. Experiments reveal bottom anti-reflective coating as method of choice to smoothen the surfaces on manufactured 3D-topographies.engrayscalelithography3D-topographymodelingthree-state lithography modelmasklayoutsmootheningDDC::600 Technik, Medizin, angewandte Wissenschaften::620 Ingenieurwissenschaftenconference paper