Gorecki, C.C.GoreckiBargiel, S.S.BargielAlbero, J.J.AlberoPassilly, N.N.PassillyRousselot, C.C.RousselotZeitner, U.U.ZeitnerGastinger, K.K.Gastinger2022-03-112022-03-112011https://publica.fraunhofer.de/handle/publica/37385810.1109/TRANSDUCERS.2011.5969709This work presents the micromachined array-type Mirau interferometer, designed for massively parallel (5×5 channels) inspection of wafer-scale MEMS in the regime of a low coherence interferometry. The device is composed of vertically assembled glass wafers with batch-fabricated micro-optical components, i.e. refractive lenses, diffractive elements for correction of lens aberrations, micromirrors and multilayer dielectric beam-splitter. The fabrication processes of micro-optical components are described. The resolution measurement with USAF 1951 test pattern shows the capability of interferometer to distinguish lines down to 2.4 m wide. The operation of interferometer demonstrator with the 700 × 700 m2 field of view is successfully demonstrated using commercially available MEMS IR sensor.en660conference paper