Waller, Erik HagenErik HagenWallerFreymann, Georg vonGeorg vonFreymann2022-03-052022-03-052016https://publica.fraunhofer.de/handle/publica/24590110.3390/polym8080297One of the major challenges in high-resolution m-printing is the cross-talk between features written in close proximity-the proximity effect. This effect prevents, e.g., gratings with periods below a few hundred nanometers. Surprisingly, the dependence of this effect on space and time has not thoroughly been investigated. Here, we present a spatial-light-modulator based method to dynamically measure the strength of the proximity effect on length and timescales typical to m-printing. The proximity strength is compared in various photo resists. The results indicate that molecular diffusion strongly contributes to the proximity effect.en3D m-printingdirect laser writingphoto resistpolymerization621547journal article