Investigation of the plasma treatment in a multistep TiN MOCVD process

Riedel, S.S.RiedelSchulz, S.E.S.E.SchulzGessner, T.T.Gessner2022-03-032022-03-032000https://publica.fraunhofer.de/handle/publica/19836910.1016/S0167-9317(99)00324-Xen621Investigation of the plasma treatment in a multistep TiN MOCVD processjournal article