Schultrich, B.B.SchultrichLenk, A.A.LenkWitke, T.T.Witke2022-03-082022-03-081998https://publica.fraunhofer.de/handle/publica/304005The device has a dielectric tube of silicon dioxide with a wall thickness of 2 mm, a length of 7 cm and an inner diameter of 7 mm. Into one end is set a cathode [1] that is made of metal, semiconductor material or carbon. An anode [3] is set at the other end and the separating distance is 8 cm. The anode may also be fabricated from metal, semiconductor material or carbon. A capacitor is discharged to trigger the plasma in the tube. The anode side is within an oxygen filled space that contains a substrate of silicon [6] and an extraction grating [5]. The dielectric material may be aluminium oxide. USE - For production of thin dielectric sheets such as ceramic materials. ADVANTAGE - Ensures pulsed discharge on dispensing target.de608667621671Verfahren und Vorrichtung zur Erzeugung hochangeregter Plasmen mittels gepulster FunkenentladungGeneration of a high power plasma for production of thin dielectric layers - has a tube of silicon dioxide with cathode and anode system within oxygen atmosphere with controlled pressure.patent1996-19629054