Jiang, X.X.JiangJia, C.L.C.L.JiaSzyszka, B.B.Szyszka2022-03-032022-03-032002https://publica.fraunhofer.de/handle/publica/20262410.1063/1.1473683(0001)-oriented aluminum-doped zinc oxide films were prepared using a magnetron sputtering technique. High-resolution transmission-electron- microscopic images show that the oriented grains nucleate directly on the substrate surface and grow with equal lateral dimensions through the film thickness. A surface-energy-driven self-texture mechanism was proposed on the basis of process modes. A method for manufacturing specific film structure by patterning the substrate surface is tested and discussed.enmagnetron sputtering techniquesubstrate surfacefilm thicknesstexture formationSi667621journal article