Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication

Under CopyrightRumler, MaximilianMaximilianRumlerFader, RobertRobertFaderHaas, AnkeAnkeHaasRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, LotharLotharFrey2022-03-1218.1.20132012https://publica.fraunhofer.de/handle/publica/37760010.24406/publica-fhg-377600ennanoimprintUV-NILGalliumimplantationreactive ion ecthing670620530Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabricationposter