Characterization of ultra-thin layers in MOS-devices with XUV reflectometry

Banyay, M.M.BanyayJuschkin, L.L.JuschkinLoosen, P.P.LoosenRoeckerath, M.M.RoeckerathSchubert, J.J.Schubert2022-03-042022-03-042009https://publica.fraunhofer.de/handle/publica/220043en621Characterization of ultra-thin layers in MOS-devices with XUV reflectometrybook article