Schultrich, BerndBerndSchultrich2022-03-052022-03-052018https://publica.fraunhofer.de/handle/publica/25487510.1007/978-3-662-55927-7_17Sputtering represents the standard PVD method for the preparation of high quality thin films.en621671Activated sputter deposition of ta-C filmsbook article