Reactive sputter deposition of alumina thin films using a hollow cathode sputtering source

Pradhan, A.A.PradhanShah, S.I.S.I.ShahUnruh, K.M.K.M.Unruh2022-03-032022-03-032002https://publica.fraunhofer.de/handle/publica/20292110.1063/1.1512340en620660671681Reactive sputter deposition of alumina thin films using a hollow cathode sputtering sourcejournal article