Kal, S.S.KalKasko, I.I.KaskoRyssel, H.H.Ryssel2022-03-032022-03-031995https://publica.fraunhofer.de/handle/publica/18688910.1007/BF02744838en670620530Preparation and characterization of ultra-thin cobalt silicide for VLSI applicationsjournal article