Schiller, S.S.SchillerHeisig, U.U.HeisigSteinfelder, K.K.SteinfelderKorndörfer, C.C.Korndörfer2022-03-022022-03-021982https://publica.fraunhofer.de/handle/publica/17020710.1016/0040-6090(82)90511-9en667670620541Cr-Si resistive films produced by magnetron-plasmatron sputteringjournal article