Schaefer, S.S.SchaeferSchetter, ChristianChristianSchetterLüdemann, RalfRalfLüdemannGlunz, Stefan W.Stefan W.Glunz2022-03-092022-03-091999https://publica.fraunhofer.de/handle/publica/334017en621697Reactive ion etching for crystalline silicon solar cell fabricationconference paper