Dehm, C.C.DehmGyulai, J.J.GyulaiRyssel, H.H.Ryssel2022-03-032022-03-031992https://publica.fraunhofer.de/handle/publica/18200510.1063/1.107409en670620530621Shallow, titanium-silicided p and n junction formation by triple germanium amorphizationjournal article